Calculus Applications in the Photolithographic Manufacture of Microelectronics.

by Matthew Behunek

 

Submitted : Fall 2017

The project objective was to understand how principles of calculus are utilized to create an accurate projection in the Photolithographic manufacture of microelectronics. Equations for a Fourier Series were used to describe the wavelike interactions of light and determine how the number of diffraction peaks captured affects the final projected image. As diffraction peaks were lost the width of the intended projection increased causing the projection to lose accuracy and precision. Therefore, capturing more diffraction peaks leads to a more ideal projection. The equations used for this process provide engineering students with insight into the photolithographic process as they enter higher levels of their education.

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